IG2 Ion Source

The IG2 sputter ion package is the perfect solution for low cost ion beam etching and sputter cleaning of specimens for surface analysis, cleaning STM tips, general vacuum science and nano technology applications. If you just want to clean the surface of your sample or STM tip this simple to operate and reliable sputter ion source and controller is the perfect solution.  The IG2 can also operate with inert gases such as Argon as well as Oxygen.

Key features

  • Low cost
  • Easy to use
  • Long Filament Lifetime
  • Source Type: Hot filament electron impact (dual filament, backfill type) Beam Energy ≤ 2 keV in 500 eV increments
  • Beam Energy: ≤ 2 keV in 500 eV increments
  • Beam Diameter: at 25 mm working distance - 2.5 mm FWHM (at target)
  • Beam Diameter: at 50 mm working distance - 3.5 mm FWHM (at target)
Technical Information

PHI Compatibility The RBD 04-165 Ion Source is interchangeable with the PHI 04-161 and 04-162 ion sources. The RBD 32-175 Ion Source Control is interchangeable with the PHI 20-045 control. As a result, the RBD 04-165 works with the PHI 20-045, and the PHI 04-161 and 04-162 ion sources work with the RBD 32-175.

Working Distance Typically 25-50 mm from end-of-optics to target.

Theory of Operation

The 04-165 Backfill Ion Source generates an energetic inert gas ion beam for sputter-etching solid surfaces. The source requires a static pressure of 5x10-5 torr with an inert gas such as argon. Ions are generated by electron impact within the ion source’s dual filament ionisation chamber and are then focused at the target with energies of up to 2 kV. The impurity content of the ion beam is minimised by using an off-axis filament geometry. A focusing lens permits high ion current density to be obtained for a given operating pressure and source-to-sample distance. A dual tungsten filament assembly permits continued operation when the first filament opens. The expected lifetime of the filament assembly is several years under normal usage at the recommended operating conditions. The filament assembly is easily replaced in the field.

The Model 32-175 2 kV Ion Source Control provides all the necessary voltages and currents required to operate the 04-165 2 kV Backfill Ion Source. The beam voltage may be activated manually or remotely. Additionally, the emission current may be monitored in order to appropriately set the filament current. Download application notes: application 1,  application 2. IG2 sputter ion source package is developed by RBD Instruments. We are the sole European distributor representing RBD Instruments.

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